Mechanical scanning probe nanolithography: modeling and application

Lytvyn, P.M. and Lytvyn, O.S. and Dyachyns’ka, O.M. and Grytsenko, K.P. and Schrader, S. and Prokopenko, I.V. (2012) Mechanical scanning probe nanolithography: modeling and application Semiconductor Physics, Quantum Electronics & Optoelectronics, 15 (4). pp. 321-327. ISSN 1560-8034

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Abstract

The paper presents a study on modeling the mechanical interaction between the tip of a scanning atomic force microscope (AFM) and surfaces of various types, which makes it possible to optimize parameters and modes for mechanical AFM nanolithography. The practical assessment of mechanical nanoprobe lithography based on the method of a direct surface patterning was carried out during fabrication of functional elements for molecular electronics. Polymethine dye nanowires of a specified configuration and the cross-section 3×20 nm have been successfully formed in a multilayer polytetrafluoroethylene/gold/silicon nanostructure.

Item Type: Article
Uncontrolled Keywords: scanning probe microscope; nanolithography; nanostructures
Subjects: Articles in journals > Наукові (входять до інших наукометричних баз, крім перерахованих, мають ISSN, DOI, індекс цитування)
Divisions: Institutes > Institute of Society > Chair of Information Technologies and Mathematics > Chair of Computer Science
Depositing User: Оксана Степанівна Литвин
Date Deposited: 24 Jun 2014 08:20
Last Modified: 25 Nov 2015 08:49
URI: http://elibrary.kubg.edu.ua/id/eprint/3336

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