Approach of determining the thickness of nanometer layers by atomic force microscopе

Прокопенко І.В., Литвин П.М., Литвин О.С. (2012) Approach of determining the thickness of nanometer layers by atomic force microscopе 67348.

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Abstract

The method for determining the thickness of nanometer layers deposited on a substrate, which comprises scratches that reaches the boundary of the "substrate-layer". The method is remarkable that in a layer form a series of scrathes that incised by probe of an atomic force microscope with increasing loading force on the probe, measuring the depth of the scratches at the same time. The depth value that remains unchanged for the last two or more scratches, obtained by increasing the loading force, is considered as a thickness of investigational layer.

Item Type: Patent
Additional Information: Інститут фізики напівпровідників ім. В.Є. Лашкарьова Національної академії наук України
Uncontrolled Keywords: nanolayers; thickness; atomic force microscopy
Subjects: Патенти на винаходи
Divisions: Institutes > Institute of Society > Chair of Information Technologies and Mathematics > Chair of Computer Science
Depositing User: Оксана Степанівна Литвин
Date Deposited: 25 Feb 2015 09:26
Last Modified: 13 Dec 2016 13:20
URI: http://elibrary.kubg.edu.ua/id/eprint/6222

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