Dan’ko, V.A. and Indutny , I.Z. and Myn’ko, V.I. and Shepeliavyi, P.E. and Lykanyuk, M.V. and Lytvyn, O.S. (2012) Interference photolithography using photoetching effect In chalcogenide films Journal of Non-Oxide Glasses, 3 (2). pp. 13-18. ISSN 2605-6874
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Abstract
The surface roughness of thin amorphous films of chalcogenide glasses (ChG) after photostimulated dissolution in amine-based selective etchant has been investigated. It is established that the rms roughness of the annealed and photoetched ChG film substantially smaller than the as-evaporated film and etched in the same selective etchant. This makes it possible to obtain more higher-quality lithographic masks or periodic relief-phase structures using new photoetching effect: photo-induced enhancement in solubility of annealed ChG layers. A possible mechanism for the photoinduced etching of ChGs is discussed. The diffraction gratings on germanium ChG - more environmentally acceptable compounds than traditionally used arsenic chalcogenides, were recorded for the first time by using the effect of hotoinduced etching on ChG layers and their characteristics were studied
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | chalcogenide glasses; photo-induced enhancement; diffraction gratings; atomic force microscopy |
| Subjects: | Це архівна тематика Київського університету імені Бориса Грінченка > Статті у журналах > Інші (не входять ні до фахових, ні до наукометричних баз) |
| Divisions: | Це архівні підрозділи Київського університету імені Бориса Грінченка > Кафедра інформатики |
| Depositing User: | Оксана Степанівна Литвин |
| Date Deposited: | 26 Sep 2013 12:55 |
| Last Modified: | 25 Nov 2015 08:48 |
| URI: | https://elibrary.kubg.edu.ua/id/eprint/2226 |
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